Products
STE RTP150 Rapid Thermal Processing System for high-temperature processes
Supplier: SemiTEq JSC
![](/pr_img/1002110015/20160831/47125224/RTA70H.jpg)
System for high-temperature treatment of semiconductor wafers in controlled gas, vacuum, oxidizingor deoxidizing atmosphere
Special design of aluminum chamber allows carrying out thermal annealing at extremely high temperatures (up to 1300°С) in combination with long annealing time (up to 60 min). This
system can be used both for R&D activities and for pilot production. Maximum diameter of wafers is 150 mm.