Products
STE75 New compact MBE System for III-V, II-VI and III-N compounds growth
Supplier: SemiTEq JSC
Compact new STE75 MBE system is designed for growth of А3В5, wide band А2В6 and А3N compounds (in special version). STE75 is intended as compact, versatile and power tool for wide range of R&D in the field of modern semiconductor applications based on А3В5/А2В6 and III-Nitrides.
Supplier: REC
Development, production and export of high-tech products
Supplier: ROSTEC
In 2014 Rostec completed collection and consolidation of fragmented industrial assets, and the strong growth of the company began. This demanded to update the strategy.
STE35 Three-chamber MBE System for А3В5 growth
Supplier: SemiTEq JSC
STE35 is a modern technological platform for precise growth of epitaxial layers on wafers with diameter of 2”, 3”, 100 mm, as well as three 2” wafers on the same platen.
MBE system STE35 is intended for R&D activities and pilot production of epitaxial structures in “lab-to-lab” mode in InAlGaAsSb/GaAs systems.
STE EB71 Electron-beam evaporation system for various applications
Supplier: SemiTEq JSC
Automated station for E-Beam evaporation of high-quality thin-film compositions in UHV
The System was designed in accordance with “lab to fab” approach and is intended for both intensive R&D activities and pilot production. The system design enables to integrate it into multipurpose UHV cluster process line. Maximum quantity of wafers in one process is: 3х3” or 6х2”. Wafers are installed on a spherical-profile holder, considering specific features of “lift-off” process.
STE MS900 Versatile Magnetron and Resistance Sputtering System
Supplier: SemiTEq JSC
New versatile System for magnetron and thermo resistance sputtering for batch wafer processing
STE MS900 System allows to sputter multicomponent layers (metals, resistant layers etc.) on the substrate heated up to 500°C. System is designed for both active R&D and smallscale production. Maximum number of sputtering substrates in the same process: 150 mm – 6 pcs. Targets with diameter of 6’’ ensure uniformity of ±2% for 100 mm. Magnetic mount makes targets replacement very easy.
STE RTP150 Rapid Thermal Processing System for high-temperature processes
Supplier: SemiTEq JSC
System for high-temperature treatment of semiconductor wafers in controlled gas, vacuum, oxidizingor deoxidizing atmosphere
Special design of aluminum chamber allows carrying out thermal annealing at extremely high temperatures (up to 1300°С) in combination with long annealing time (up to 60 min). This
system can be used both for R&D activities and for pilot production. Maximum diameter of wafers is 150 mm.